Chemical Liquid Phase Deposition of Thin Aluminum Oxide Films

Introduction Inorganic oxide films have attracted a lot of interest in the last several decades. Among them, silicon dioxide films are widely used in modern microelectronics, optics and mechanics. This material has been grown by various methods including thermal oxidation, chemical vapor phase deposition, plasma-enhanced chemical vapor phase deposition, and so on.1,2 Recently, Nagayama et al.3 have reported that SiO2 thin films could be produced by a new chemical method of liquid phase depos…     

用水热法在铁铬铝合金片上原位合成MCM-22沸石膜

 采用水热法在铁铬铝合金片载体上原位合成了MCM-22沸石膜,并采用X射线衍射和扫描电子显微镜对沸石膜进行了表征,探讨了成膜的影响因素. 结果表明,载体预处理条件对合成沸石膜的品质有较大的影响. 载体仅经碱处理后合成的沸石膜稀疏而不连续; 载体先经碱处理再经酸处理后可得到连续致密的沸石膜,且晶片取向均一; 载体预先涂覆Al2O3胶过渡层后制得的MCM-22沸石膜经超声波清洗后不会脱落,表明沸石膜与载体间的结合力增强. 此外,增大晶化母液量有利于沸石膜的生长.     

Adsorptive passivation of iron by organic acid anions

Studies on the iron passivation by organic acid anions in aqueous solutions are briefly reviewed. It is shown that the passivation can be caused only by their adsorption, retarding both the iron dissolution and the formation of oxide films. Earlier, it had been believed that oxide films play a dominant role in the iron passivation in neutral solutions. The recent viewpoint is that such nonoxide iron passivation can occur in solutions of salts of not only aromatic amino acids (sodium phenylantranilate and its substitutes), but other carboxylic acids as well. An important role of chemisorption and hydrophobic properties of anions for the formation of adsorption passive films is emphasized. New possibilities for inhibitor protection of iron against corrosion, which is based on adsorptive passivation, are pointed out.Translated from Elektrokhimiya, Vol. 40, No. 12, 2004, pp. 1503–1507.Original Russian Text Copyright © 2004 by Kuznetsov.     

叠氮二乙基铝合成及其相关反应的研究

在芳烃溶剂中用氯化二乙基铝和叠氮化钠反应合成了叠氮化二乙基铝(DEAA),其产率高达87%,比文献值高出17%。在正己烷中没有合成出DEAA,在含30%四氢呋喃(THF)的正己烷中合成出DEAA·THF配合物。在芳烃溶剂中,随着苯环上甲基数目的增加,DEAA的收率增加。测定了氯化二乙基铝、氯化二乙基铝的正己烷溶液、氯化二乙基铝的甲苯溶液的 ²⁷Al NMR谱。由 ²⁷Al NMR谱数 据确定了氯化二乙基铝在甲苯中解离平衡式,计算了氯化二乙基铝在甲苯中解离平衡的热力学数据。用DEAA与苯甲酸甲酯直接合成了苯甲酰叠氮,并表征了其结构。这是一个新反应,至今无文献报导。用实验证明了在正己烷溶液中,用氯化二乙基铝、叠氮化钠与苯甲酸甲酯合成苯甲酰叠氮,没有经过氯化二乙基铝和叠氮化钠反应生成中间体DEAA的这一步。依据实验事实建立了上述三种反应的反应机理。     

无火焰原子吸收测定血清中的铝

用无火焰原子吸收法测定血清中的铝,样品用高纯水十倍稀释后,用标准加入法进行测定,不需使用基体改进剂和氘灯扣除背景。方法简单、准确、灵敏度高。用含铝20ng/ml的一份十倍稀释血清样,重复测十次,变异系数5%左右。     

Stabilization of p-block organoelement terminal hydroxides, thiols, and selenols requires newer synthetic strategies

Metal hydroxides represent a very interesting and highly useful class of compounds that have been known to chemists for a very long time. While alkali and alkaline earth metal hydroxides (s‐block) are commonplace chemicals in terms of their abundance and their use in a chemical laboratory as bases, the interest in Brønsted acidic molecular terminal hydroxides of p‐block elements, such as aluminum and silicon, has been of recent origin, with respect to the variety of applications these compounds can offer both in materials science and catalysis. Moreover, these systems are environmentally friendly, relative to the metal halides, owing to their ‐OH functionality (resembling that of water). Design and conceptualization of the corresponding terminal thiols, selenols, and tellurols (M? SH, M? SeH, and M? TeH) offer even more challenging problems to synthetic inorganic chemists. This concept summarizes some of the recent strategies developed to stabilize these otherwise very unstable species. The successful preparation of a number of silicon trihydroxides a few years back resulted in the generation of several model compounds for metal–silicates. The recent synthesis of unusual aluminum compounds such as RAl(OH)₂, RAl(SH)₂, and RAl(SeH)₂ with terminal EH (E=O, Se, or Se) groups is likely to change the ways in which some of the well‐known catalytic conversions are being carried out. The need for very flexible and innovative synthetic strategies to achieve these unusual compounds is emphasized in this concept.     

人工神经网络X射线荧光光谱法测定钢中酸溶铝

建立了一种人工神经网络-X射线荧光光谱法测定钢中酸溶铝的方法，用X射线荧光光谱法测定低合金钢中总铝值，应用所建立的ANN-BP网络模型，输入总铝含量直接预测出酸溶铝含量。同时使用改进的BP算法，避免了神经网络学习中可能产生的麻痹现象。该方法用于钢中酸溶铝的测定，结果满意。     

High temperature corrosion behaviour of M(Co,Ni)CrAIY-coatings on high temperature materials-microanalytical investigations

In our former investigations, the phenomenon high temperature corrosion (HTC) was described exemplarily on selected materialcoating combinations for blades of stationary gas turbines, mainly in the temperature region of up to 750° C. To answer the question, in which manner higher gas inlet and/or higher material surface temperature would influence the HTC behaviour, a special analytical technique—the integral layer profile analysis—was introduced to ameliorate concentration profile methods. By examining IN 738 LC specimens with CoCrAlY plasma spray coating, stressed by hot gas at 900° C, the limits of this system are shown by explaining the corrosion mechanism; the method is also used for other systems, e.g. U 520 with NiCrAlY coating at 750° C.     

贫水电解质体系制备多孔阳极氧化铝模板的研究

在有机溶剂为主的含草酸电解质中,研究了大孔径有序度高的阳极氧化铝(AAO)的一步法电化学制备.实验证实,电解质中水含量的降低能够有效抑制铝的电氧化速率和溶解速率,使得其氧化膜孔道的生长能够稳定进行,所得到的六方孔道排列有序度明显高于纯水溶剂制备的电解质体系下的产物.考察了水含量、有机溶剂种类以及电解质浓度对AAO模板孔道形貌的影响.结果表明,有机溶剂贫水电解质体系使得电氧化电压的选取范围比水溶液电解质体系更宽,孔径连续可调,反应条件温和.该方法适合于制备均匀大孔径的AAO模板.     

Copper corrosion in buffered and non-buffered synthetic seawater: a comparative study

The electrochemical behaviour of copper in neutral buffered and non-buffered synthetic seawater and in pure chloride solutions has been studied by cyclic voltammetry, weight loss measurements, open circuit potential and scanning electron microscopy (SEM). Values of the repassivation potentials of Cu in non-buffered and buffered synthetic seawater, at 50 mV s^–1, were 0.12 and 0.46 V vs. SCE, respectively. The sharpness, heights and location of the different peaks as well as their charges were shown to be influenced by the composition of the solution, buffering conditions, deoxygenation, polarization potential and time. High chloride concentrations lead to higher oxidation charges. The anodic and the cathodic charges were shown to increase as the chloride concentration increases. The open circuit potential transients of copper in non-deoxygenated, non-buffered synthetic seawater indicate pitting from the beginning of the exposure, while in buffered solutions the pitting appeared only after a quite long exposure period, i.e. after 40 days. Corrosion rates of Cu samples after 3 months of immersion were higher in solutions of pure chloride (0.5 M) than in synthetic seawater. After six months the differences were even more noticeable. SEM images have showed a somewhat higher density of pits on copper samples immersed in the chloride solution (0.5 M), in comparison with those in synthetic seawater.